ATH-M Series
ATH 400M, ATH1300M ,ATH1600M,ATH2300M
300~2100 l/s pumping speed design
Brand new maglev five-way horizontal & N2 purge & Heater design
Applicable to PVD, CVD, Etch processes
- Glass coating,
- Micro systems machining,
- Ion beam rectification,
- Electron microscopy,
- Space simulation chambers,
- Particle accelerators,
- Semiconductor processes (etch, CVD, ion implant),
- Coating and thin films deposition,
- Ion milling
- And many R&D experiments
| Type | Exhaust flange | Extraction efficiency for N2 | Installation direction |
| ATH 400M | ISO 100/160 | 410 l/s | Any |
| ATH 1300M | ISO 160/200 | 1250 l/s | Any |
| ATH 1600M | ISO 200/250 | 1500 l/s | Any |
| ATH 2300M | ISO 250 | 2100 l/s | Any |
Recommend
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adixen ACP 15/28/40
Main application industries:
- Semiconductor industry
- Panel industry
- Continuous vacuum coating industry
- Solar power industry
- Light emitting diode industry
- Biotechnology Pharmaceutical Industry
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Roots Vacuum Pump Air Extraction System
With various pre-pumps, the working range can be extended to medium vacuum or even high vacuum areas.
Greater pumping rates are achieved at low pressures.
Pumping rate: 150~300~600~1000~2000 m3/h
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ADP ADS SERIES TWO
Low energy consumption and high reliability
Suitable for semiconductor and harsh manufacturing processes
Pumping rate: 112~1700 m3/h
Ultimate pressure: 6 × 10-3 mbar